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ULTRATECH INC Patents: Applications Rejected

ULTRATECH INC Patent Applications Rejected

17 applications abandoned without a patent; the status gives the reason, newest filing first, as the USPTO Open Data Portal records them; the company is the first-named applicant. The application number opens the full record at Patent Center.

  • 2018-04-09: Application 15948627; Invention Methods of Forming Sources and Drains for FinFETs Using Solid Phase Epitaxy With Laser Annealing; Applicant Ultratech, Inc.; Status Abandoned -- Failure to Respond to an Office Action.
  • 2018-01-19: Application 15875484; Invention Methods of Forming Product Wafers Having Semiconductor Light-Emitting Devices To Improve Emission Wavelength Uniformity; Applicant Ultratech, Inc.; Status Abandoned -- Failure to Respond to an Office Action.
  • 2018-01-16: Application 15872121; Invention Methods of Forming MLD Films Using Polyols With Long Carbon Backbones; Applicant Ultratech, Inc.; Status Abandoned -- Failure to Respond to an Office Action.
  • 2017-02-17: Application 15435333; Invention Quartz crystal microbalance assembly for ALD systems; Applicant Ultratech, Inc.; Status Abandoned -- Failure to Respond to an Office Action.
FiledApplicationInventionApplicantStatusPublished asInventor nameInventor countryExaminer
2018-04-0915948627Methods of Forming Sources and Drains for FinFETs Using Solid Phase Epitaxy With Laser AnnealingUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20180308758A1
Michael H. Willemann
United States
JUNGE, BRYAN R.
2018-01-1915875484Methods of Forming Product Wafers Having Semiconductor Light-Emitting Devices To Improve Emission Wavelength UniformityUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20180226535A1
Andrew M. Hawryluk
United States
JANG, BO BIN
2018-01-1615872121Methods of Forming MLD Films Using Polyols With Long Carbon BackbonesUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20180200753A1
Mark J. Sowa
United States
CHEN, BRET P
2017-02-1715435333Quartz crystal microbalance assembly for ALD systemsUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170260629A1
Laurent Lecordier
Michael Ruffo
United States
United States
CHEN, KEATH T
2017-01-2715417896PE-ALD METHODS WITH REDUCED QUARTZ-BASED CONTAMINATIONUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170241019A1
Mark J. Sowa
Adam Bertuch
Ritwik Bhatia
United States
United States
United States
TUROCY, DAVID P
2017-01-0415323805IMPROVED THROUGH SILICON VIAUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170194204A1
Mark Sowa
United States
TRINH, HOA B
2016-12-2015385381VAPOR DEPOSITION SYSTEMS AND METHODSULTRATECH, INC.Abandoned -- Failure to Respond to an Office ActionUS20170159177A1
Douwe J. Monsma
Jill S. Becker
Netherlands
United States
LUND, JEFFRIE ROBERT
2016-11-3015364309Full-wafer inspection methods having selectable pixel densityUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170178980A1
David M. Owen
Byoung-Ho Lee
Eric Bouche
Andrew M. Hawryluk
United States
United States
United States
United States
QUINTO, KEVIN V
2016-09-2015270019High-throughput multichamber atomic layer deposition systems and methodsUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170088952A1
Andrew M. Hawryluk
United States
MOORE, KARLA A
2016-09-0615257493Laser-assisted atomic layer deposition of 2D metal chalcogenide filmsUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170073812A1
Ganesh Sundaram
United States
HERNANDEZ-KENNEY, JOSE
2016-08-2315244097Plasma-enhanced atomic layer deposition system with rotary reactor tubeUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170062191A1
Arthur W. Zafiropoulo
Andrew M. Hawryluk
United States
United States
MILLER, JR, JOSEPH ALBERT
2016-07-2215113659VAPOR DELIVERY SYSTEMUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20170145564A1
Adam Bertuch
Michael Ruffo
United States
United States
BURKHART, ELIZABETH A
2016-05-0415145833Microchamber laser processing systems and methods using localized process-gas atmosphereUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20160354865A1
James T. McWhirter
United States
MURANAMI, MASAHIKO
2016-04-2815141783SYSTEMS AND PROCESSES FOR FORMING THREE-DIMENSIONAL INTEGRATED CIRCUITSUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20160240440A1
Arthur W. Zafiropoulo
Yun Wang
Andrew M. Hawryluk
United States
United States
United States
MIYOSHI, JESSE Y
2015-09-1414853594REACTION CHAMBER WITH REMOVABLE LINERUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20160002781A1
Roger R. Coutu
Jill S. Becker
Douwe Johannes Monsma
United States
United States
Netherlands
GAMBETTA, KELLY M
2013-09-2714040326Epitaxial growth of compound semiconductors using lattice-tuned domain-matching epitaxyUltratech, Inc.Abandoned -- Failure to Respond to an Office ActionUS20150090180A1
Andrew M. Hawryluk
Daniel Stearns
United States
United States
BRATLAND JR, KENNETH A
2013-02-2813781682Systems and methods for material processing using light-emitting diodesULTRATECH, INC.Abandoned -- Failure to Respond to an Office ActionUS20140238958A1
Arthur W. Zafiropoulo
Andrew M. Hawryluk
United States
United States
REICHLEN, KRISTOPHER D