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ULTRATECH INC Patents: Applications Pending

ULTRATECH INC Patent Applications Pending

42 applications still open at the USPTO, newest filing first, as the USPTO Open Data Portal records them; the company is the first-named applicant. The application number opens the full record at Patent Center.

  • 2018-01-23: Application PCTUS2018014840; Invention Chuck Systems and Methods Having Enhanced Electrical Isolation For Substrate-Biased ALD; Applicant ULTRATECH, INC.; Status RO PROCESSING COMPLETED-PLACED IN STORAGE.
  • 2018-01-16: Application PCTUS2018013782; Invention METHODS OF FORMING MLD FILMS USING POLYOLS WITH LONG CARBON BACKBONES; Applicant ULTRATECH, INC.; Status RO PROCESSING COMPLETED-PLACED IN STORAGE.
  • 2017-07-28: Application 62538412; Invention Laser-Based Systems And Methods For Melt-Processing of Metal Layers in Semiconductor Manufacturing; Applicant Ultratech, Inc.; Status Provisional Application Expired.
  • 2017-04-21: Application 62488072; Invention METHODS OF FORMING SOURCES AND DRAINS FOR FINFETS USING SOLID PHASE EPITAXY WITH LASER ANNEALING; Applicant Ultratech, Inc.; Status Provisional Application Expired.
FiledApplicationInventionApplicantStatusPublished asInventor nameInventor countryExaminer
2018-01-23PCTUS2018014840Chuck Systems and Methods Having Enhanced Electrical Isolation For Substrate-Biased ALDULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
MICHAEL J. SERSHEN
ADAM BERTUCH
United States
United States
2018-01-16PCTUS2018013782METHODS OF FORMING MLD FILMS USING POLYOLS WITH LONG CARBON BACKBONESULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
MARK J. SOWA
United States
2017-07-2862538412Laser-Based Systems And Methods For Melt-Processing of Metal Layers in Semiconductor ManufacturingUltratech, Inc.Provisional Application Expired
Serguei Anikitchev
Andrew M. Hawryluk
United States
United States
2017-04-2162488072METHODS OF FORMING SOURCES AND DRAINS FOR FINFETS USING SOLID PHASE EPITAXY WITH LASER ANNEALINGUltratech, Inc.Provisional Application Expired
Michael H. Willemann
United States
2017-02-0362454088METHODS OF FORMING PRODUCT WAFERS HAVING SEMICONDUCTOR LIGHT-EMITTING DEVICES TO IMPROVE EMISSION WAVELENGTH UNIFORMITYUltratech, Inc.Provisional Application Expired
Andrew M. Hawryluk
United States
2017-01-2762451377Chuck systems and methods with enhanced electrical isolation for substrate-biased ALDUltratech, Inc.Provisional Application Expired
Michael J. Sershen
Adam Bertuch
United States
United States
2017-01-1662446708Methods of forming MLD films using polyols with long carbon backbonesUltratech, Inc.Provisional Application Expired
Mark J. Sowa
United States
2016-12-0862431790Wafer chuck with contractable sealing devices for securing warped wafersUltratech, Inc.Provisional Application Expired
Raymond Ellis
A.J. Crespin
Konrad Heinle
Charles Hu
United States
United States
United States
United States
2016-12-0862431683Scanning methods for focus control for lithographic processing of reconstituted wafersUltratech, Inc.Provisional Application Expired
Paul M. Bischoff
Emily M. True
Raymond Ellis
A.J. Crespin
United States
United States
United States
United States
2016-11-0262416262Wafer chuck apparatus with micro-channel regionsUltratech, Inc.Provisional Application Expired
Raymond Ellis
A.J. Crespin
United States
United States
2016-03-0862304968QUARTZ CRYSTAL MICROBALANCE ASSEMBLY FOR ALD SYSTEMSUltratech, Inc.Provisional Application Expired
Laurent Lecordier
Michael Ruffo
United States
United States
2016-02-2262298402PE-ALD METHODS WITH REDUCED QUARTZ-BASED CONTAMINATIONUltratech, Inc.Provisional Application Expired
Mark J. Sowa
Adam Bertuch
Ritwick Bhatia
United States
United States
United States
2015-12-1862269301Full-wafer inspection methods having selectable pixel densityUltratech, Inc.Provisional Application Expired
David M. Owen
Byoung-Ho LEE
Eric Bouche
Andrew M. Hawryluk
United States
United States
United States
United States
2015-12-0762263917Systems and methods of characterizing process-induced wafer shape for process control using CGS interferometryUltratech, Inc.Provisional Application Expired
David M. Owen
United States
2015-10-2162244467Methods of forming an ALD-inhibiting layer using a self-assembled monolayerUltratech, Inc.Provisional Application Expired
Laurent Lecordier
United States
2015-09-2862233575High-Throughput multichamber atomic layer deposition systems and methodsUltratech, Inc.Provisional Application Expired
Andrew M. Hawryluk
United States
2015-09-1562218734Laser-assisted atomic layer deposition of 2D metal chalcogenide filmsUltratech, Inc.Provisional Application Expired
Ganesh Sundaram
United States
2015-08-3162212021Plasma-enhanced atomic layer deposition system with rotary reactor tubeUltratech, Inc.Provisional Application Expired
Arthur W. Zafiropoulo
Andrew M. Hawryluk
United States
United States
2015-07-2262195349HIGH-EFFICIENCY LINE-FORMING OPTICAL SYSTEMS AND METHODS USING A SERRATED SPATIAL FILTERUltratech, Inc.Provisional Application Expired
Serguei Anikitchev
United States
2015-07-2062194426Masking methods for ALD processes for electrode-based devicesUltratech, Inc.Provisional Application Expired
Ritwik Bhatia
United States
2015-06-1562175492Polarization-based coherent gradient sensing systems and methodsUltratech, Inc.Provisional Application Expired
David G. Stites
United States
2015-06-0862172701Microchamber laser processing systems and methods using localized process-gas atmosphereUltratech, Inc.Provisional Application Expired
James McWhirter
United States
2015-03-2062136011Systems and methods for reducing pulsed laser beam profile non-uniformities for laser annealingUltratech, Inc.Provisional Application Expired
Yun WANG
United States
2015-01-22PCTUS2015012476VAPOR DELIVERY SYSTEMULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
MICHAEL RUFFO
ADAM BERTUCH
United States
United States
2014-11-21PCTUS2014066916IMPROVED PLASMA ENHANCED ALD SYSTEMULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
MICHAEL SERSHEN
ROBERT KANE
MARK SOWA
United States
United States
United States
2014-09-17PCTUS2014056172METHOD AND APPARATUS FOR FORMING DEVICE QUALITY GALLIUM NITRIDE LAYERS ON SILICON SUBSTRATESULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
GANESH SUNDARAM
DANIEL STEARNS
ANDREW M. HAWRYLUK
United States
United States
United States
2014-08-27PCTUS2014053015IMPROVED THROUGH SILICON VIAULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
MARK SOWA
United States
2014-06-25PCTUS2014044076FORMATION OF HETEROEPITAXIAL LAYERS WITH RAPID THERMAL PROCESSING TO REMOVE LATTICE DISLOCATIONSULTRATECH, INCRO PROCESSING COMPLETED-PLACED IN STORAGE
ANDREW M. HAWRYLUK
RITWIK BHATIA
GANESH SUNDARAM
United States
United States
United States
2014-06-02PCTUS2014040557GAS DEPOSITION HEAD FOR SPATIAL ALDULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
LAURENT LECORDIER
MICHAEL J. SERSHEN
United States
United States
2014-01-2361930870VAPOR DELIVERY SYSTEMUltratech, Inc.Provisional Application Expired
Adam Bertuch
Michael Ruffo
United States
United States
2008-11-03PCTUS2008012423MINIMIZATION OF SURFACE REFLECTIVITY VARIATIONSULTRATECH, INCRO PROCESSING COMPLETED-PLACED IN STORAGE
ANDREW M. HAWRYLUK
United States
YOUNG, LEE W
2008-04-07PCTUS2008004496METHODS OF FORMING A DENUDED ZONE IN A SEMICONDUCTOR WAFER USING RAPID LASER ANNEALINGULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
ISRAEL BEINGLASS
United States
YOUNG, LEE W
2007-03-09PCTUS2007006085DETERMINATION OF LITHOGRAPHIC MISALIGNMENT BASED ON CURVATURE AND STRESS MAPPING DATA OF SUBSTRATESULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
DAVID OWEN
United States
CONNOLLY, PATRICK J
2006-05-16PCTUS2006019022METHODS AND APPARATUS FOR REMOTE TEMPERATURE MEASUREMENT OF A SPECULAR SURFACEULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
DAVID A. MARKLE
United States
YOUNG, LEE W
2005-10-27PCTUS2005038777APOCHROMATIC UNIT-MAGNIFICATION PROJECTION OPTICAL SYSTEMULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
ROMEO I. MERCADO
United States
HOPPE, SHARON S
2005-04-27PCTUS2005014456LASER THERMAL PROCESSING WITH LASER DIODE RADIATIONULTRATECH, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
DAVID A. MARKLE
SOMIT TALWAR
United States
United States
THOMAS, DEBORAH A
2005-03-24PCTUS2005009694BEAMSPLITTER FOR HIGH-POWER RADIATIONULTRATECH, INC.PCT - IPER (International Preliminary Examination Report) 409-416 Mailed
IGOR LANDAU
United States
EVANS, GEOFFREY S
2005-02-18PCTUS2005005277SILICON LAYER FOR UNIFORMIZING TEMPERATURE DURING PHOTO-ANNEALINGULTRATECH, INC.PCT - IPER (International Preliminary Examination Report) 409-416 Mailed
MICHAEL O. THOMPSON
SOMIT TALWAR
United States
United States
RALIS, STEPHEN J
2004-09-28PCTUS2004031783LASER THERMAL ANNEALING OF LIGHTLY DOPED SILICON SUBSTRATESULTRATECH, INC.PCT - IPER (International Preliminary Examination Report) 409-416 Mailed
SOMIT TALWAR
MICHAEL O. THOMPSON
DAVID A. MARKLE
BORIS GREK
United States
United States
United States
United States
NGUYEN, TUAN H
2004-08-31PCTUS2004028389LASER THERMAL PROCESSING WITH LASER DIODE RADIATIONULTRATECH, INC.PCT - IPER (International Preliminary Examination Report) 409-416 Mailed
DAVID A. MARKLE
SOMIT TALWAR
United States
United States
ELVE, MARIA ALEXANDRA
2004-05-24PCTUS2004016389DEEP ULTRAVIOLET UNIT-MAGNIFICATION PROJECTION OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUSULTRATECH, INC.PCT - IPER (International Preliminary Examination Report) 409-416 Mailed
SHIYU ZHANG
ROMEO I. MERCADO
United States
United States
CRUZ, MAGDA
2004-04-16PCTUS2004011778APPARATUS AND METHODS FOR THERMAL REDUCTION OF OPTICAL DISTORTIONULTRATECH, INC.PCT - IPER (International Preliminary Examination Report) 409-416 Mailed
DAVID A. MARKLE
United States
RAIZEN, DEBORAH A