CMC Materials, Inc. Patent Applications Pending
31 applications still open at the USPTO, newest filing first, as the USPTO Open Data Portal records them; the company is the first-named applicant. The application number opens the full record at Patent Center.
- 2023-02-16: Application 18110633; Invention DUAL ADDITIVE POLISHING COMPOSITION FOR GLASS SUBSTRATES; Applicant CMC Materials, Inc.; Status On Appeal -- Awaiting Decision by the Board of Appeals.
- 2022-10-11: Application 63415148; Invention CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON SILICON FILMS; Applicant CMC Materials, Inc.; Status Provisional Application Expired.
- 2022-09-23: Application 17951288; Invention SILICA-BASED SLURRY COMPOSITIONS CONTAINING HIGH MOLECULAR WEIGHT POLYMERS FOR USE IN CMP OF DIELECTRICS; Applicant CMC Materials, Inc.; Status Notice of Appeal Filed.
- 2022-09-22: Application 63409094; Invention DRAG REDUCING POLYALPHA OLEFIN SLURRY AND METHODS OF MAKING AND USING THE SAME; Applicant CMC Materials, Inc.; Status Provisional Application Expired.
| Filed | Application | Invention | Applicant | Status | Published as | Inventor name | Inventor country | Examiner |
|---|---|---|---|---|---|---|---|---|
| 2023-02-16 | 18110633 | DUAL ADDITIVE POLISHING COMPOSITION FOR GLASS SUBSTRATES | CMC Materials, Inc. | On Appeal -- Awaiting Decision by the Board of Appeals | US20230323158A1 | Tong LI | Singapore | AHMED, SHAMIM |
| 2022-10-11 | 63415148 | CHEMICAL-MECHANICAL POLISHING COMPOSITION FOR HEAVILY-DOPED BORON SILICON FILMS | CMC Materials, Inc. | Provisional Application Expired | Alex VILLANI-GALE Elliot KNAPTON Brian REISS | United States United States United States | ||
| 2022-09-23 | 17951288 | SILICA-BASED SLURRY COMPOSITIONS CONTAINING HIGH MOLECULAR WEIGHT POLYMERS FOR USE IN CMP OF DIELECTRICS | CMC Materials, Inc. | Notice of Appeal Filed | US20230087984A1 | Brian REISS Brittany JOHNSON Sajo NAIK Lung-Tai LU Kim LONG Elliot KNAPTON Douglas ROBELLO Sarah BROSNAN | United States United States United States Taiwan United States United States United States United States | PHAM, THOMAS T |
| 2022-09-22 | 63409094 | DRAG REDUCING POLYALPHA OLEFIN SLURRY AND METHODS OF MAKING AND USING THE SAME | CMC Materials, Inc. | Provisional Application Expired | Deepak SHUKLA Kevin M. DONOVAN Muhammad EJAZ Trevor QUICK Ramprasad KAMISETTY | United States United States United States United States United States | ||
| 2022-09-22 | 63409086 | CHEMICAL MECHANICAL POLISHING PADS WITH A DISULFIDE BRIDGE | CMC Materials, Inc. | Provisional Application Expired | Jaeseok LEE Jessica TABERT Satish RAI Sangcheol KIM | United States United States United States United States | ||
| 2022-09-22 | 63409079 | TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURFACTANT | CMC Materials, Inc. | Provisional Application Expired | Na ZHANG Bosky SONI | United States United States | ||
| 2022-06-15 | 63352263 | UV-CURABLE RESINS FOR CHEMICAL MECHANICAL POLISHING PADS | CMC Materials, Inc. | Provisional Application Expired | Ping HUANG | United States | ||
| 2022-06-15 | 63352252 | DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS | CMC Materials, Inc. | Provisional Application Expired | Chen-Chih TSAI | United States | ||
| 2022-05-26 | 63346135 | AQUEOUS DRAG REDUCING SLURRIES FOR HYDROCARBON RECOVERY | CMC Materials, Inc. | Provisional Application Expired | Deepak SHUKLA Kevin M. DONOVAN | United States United States | ||
| 2022-03-24 | 63323192 | DUAL ADDITIVE POLISHING COMPOSITION FOR GLASS SUBSTRATES | CMC Materials, Inc. | Provisional Application Expired | Tong LI | Singapore | ||
| 2022-02-04 | PCTUS2022015178 | SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | LUNG-TAI LU ROMAN A. IVANOV BRIAN REISS | United States United States United States | ||
| 2022-02-04 | 17592612 | SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD | CMC Materials, Inc. | On Appeal -- Awaiting Decision by the Board of Appeals | US20220243094A1 | Lung-Tai LU Brian Reiss Roman A. Ivanov | Taiwan United States United States | KUVAYSKAYA, ANASTASIA ALEKSEYEVNA |
| 2022-01-26 | PCTUS2022013789 | COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | BRITTANY JOHNSON ROMAN A. IVANOV ALEXANDER W. HAINS BRIAN REISS | United States United States United States United States | ||
| 2022-01-24 | PCTUS2022013511 | ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | PAUL ANDRE LEFEVRE DUSTIN MILLER ANTHONY GALTO CARLOS BARROS GARY SNIDER | United States United States United States United States United States | ||
| 2022-01-24 | 17582667 | ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE | CMC Materials, Inc. | Non Final Action Mailed | US20220234167A1 | Paul Andre LEFEVRE Dustin Miller Gary Snider Carlos Barros Anthony Galto | United States United States United States United States United States | CRANDALL, JOEL DILLON |
| 2021-12-21 | PCTUS2021064547 | CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC SHELLS | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | DUSTIN MILLER CHEN-CHIH TSAI AARON PETERSON PAUL ANDRE LEFEVRE | United States United States United States United States | ||
| 2021-12-21 | PCTUS2021064532 | SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITY | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | JUYEON CHANG SUDEEP PALLIKKARA KUTTIATOOR MICHAEL WILLHOFF ELLIOT KNAPTON JINFENG WANG SAJO NAIK | United States United States United States United States United States United States | ||
| 2021-10-18 | PCTUS2021055344 | UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADS | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | CHEN-CHIH TSAI PING HUANG ERIC S. MOYER | United States United States United States | ||
| 2021-09-23 | 63247429 | SILICA-BASED SLURRY COMPOSITIONS CONTAINING HIGH MOLECULAR WEIGHT POLYMERS FOR USE IN CMP OF DIELECTRICS | CMC Materials, Inc. | Provisional Application Expired | Brian REISS Brittany JOHNSON Sajo NAIK Lung-Tai LU Kim LONG Elliot KNAPTON Douglas ROBELLO Sarah BROSNAN | United States United States United States Taiwan United States United States United States United States | ||
| 2021-09-14 | PCTUS2021050276 | SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | BRIAN REISS HELIN HUANG MICHAEL MORROW FERNANDO HUNG LOW | United States United States United States United States | ||
| 2021-09-02 | 63240103 | TEXTURED CMP PAD COMPRISING POLYMER PARTICLES | CMC Materials, Inc. | Provisional Application Expired | Rui MA Kaiting LI Jessica TABERT Sangcheol KIM Satish RAI | United States United States United States United States United States | ||
| 2021-08-25 | 63237095 | CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE | CMC Materials, Inc. | Provisional Application Expired | Yang-Yao LEE Hsin-Yen WU Kevin P. DOCKERY Na ZHANG | Taiwan Taiwan United States United States | ||
| 2021-08-02 | PCTUS2021044179 | TITANIUM DIOXIDE CONTAINING RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRY | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | CHENG-YUAN KO JIN-HAO JHANG | United States United States | ||
| 2021-07-26 | PCTUS2021043117 | CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORS | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | HSIN-YEN WU CHENG-YUAN KO JIN-HAO JHANG | United States United States United States | ||
| 2021-07-19 | PCTUS2021042178 | SILICON WAFER POLISHING COMPOSITION AND METHOD | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | HIROSHI KITAMURA TSUYOSHI MASUDA TAKESHI SAITO AKIHISA NAMIKI YOSHIYUKI MATSUMURA | United States United States United States United States United States | ||
| 2021-06-07 | PCTUS2021036133 | SECONDARY BATTERY CELL WITH SOLID POLYMER ELECTROLYTE | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | DEEPAK SHUKLA ZICHAO YANG KEVIN M. DONOVAN GLADYS ROCIO MONTENEGRO GALINDO | United States United States United States United States | ||
| 2021-06-07 | PCTUS2021036123 | SOLID POLYMER ELECTROLYTE COMPOSITIONS AND METHODS OF PREPARING SAME | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | DEEPAK SHUKLA ZICHAO YANG KEVIN M. DONOVAN GLADYS ROCIO MONTENEGRO GALINDO | United States United States United States United States | ||
| 2021-03-30 | PCTUS2021024844 | CMP COMPOSITION INCLUDING A NOVEL ABRASIVE | CMC MATERIALS, INC. | RO PROCESSING COMPLETED-PLACED IN STORAGE | ALEXANDER W. HAINS KIM LONG STEVEN GRUMBINE GALYNA KRYLOVA KEVIN P. DOCKERY BENJAMIN PETRO BRIAN SNEED ROMAN A. IVANOV | United States United States United States United States United States United States United States United States | ||
| 2021-02-04 | 63145842 | SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD | CMC Materials, Inc. | Provisional Application Expired | Lung-Tai LU Brian REISS Roman A. IVANOV | Taiwan United States United States | ||
| 2021-01-26 | 63141650 | COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON | CMC Materials, Inc. | Provisional Application Expired | Brittany JOHNSON Brian REISS Alexander W. HAINS Roman A. IVANOV | United States United States United States United States | ||
| 2021-01-25 | 63141368 | ENDPOINT WINDOW WITH CONTROLLED TEXTURE SURFACE | CMC Materials, Inc | Provisional Application Expired | Paul Andre LEFEVRE Dustin MILLER Gary SNIDER Carlos BARROS Anthony GALTO | United States United States United States United States United States |