Advertisement
Screener

CMC Materials, Inc. Patents: Active

CMC Materials, Inc. Active Patents

11 granted patents the USPTO still lists as patented, newest filing first, as the USPTO Open Data Portal records them; the company is the first-named applicant. The application number opens the full record at Patent Center.

  • 2022-09-02: Application 17902210; Invention TEXTURED CMP PAD COMPRISING POLYMER PARTICLES; Applicant CMC Materials, Inc.; Status Patented Case.
  • 2022-08-25: Application 17895967; Invention CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE; Applicant CMC Materials, Inc.; Status Patented Case.
  • 2022-01-26: Application 17584532; Invention COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICON; Applicant CMC Materials, Inc.; Status Patented Case.
  • 2021-12-21: Application 17557461; Invention CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC SHELLS; Applicant CMC Materials, Inc.; Status Patented Case.
FiledApplicationInventionApplicantStatusGrantedPatentPublished asInventor nameInventor countryExaminer
2022-09-0217902210TEXTURED CMP PAD COMPRISING POLYMER PARTICLESCMC Materials, Inc.Patented Case2025-11-1812472602US20230076804A1
Rui MA
Kaiting Li
Jessica Tabert
Sangcheol Kim
Satish Rai
United States
United States
United States
United States
United States
MOORE, ALEXANDRA MARIE
2022-08-2517895967CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVECMC Materials, Inc.Patented Case2025-09-3012428580US20230070776A1
Yang-Yao Lee
Hsin-Yen Wu
Kevin P. Dockery
Na Zhang
Chi-Rung Shie
Taiwan
Taiwan
United States
United States
Taiwan
DEO, DUY VU NGUYEN
2022-01-2617584532COMPOSITION AND METHOD FOR POLISHING BORON DOPED POLYSILICONCMC Materials, Inc.Patented Case2025-08-2612398293US20220235247A1
Brittany JOHNSON
Brian REISS
Alexander W. HAINS
Roman A. IVANOV
United States
United States
United States
United States
AHMED, SHAMIM
2021-12-2117557461CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC SHELLSCMC Materials, Inc.Patented Case2025-11-0412459076US20220193860A1
Dustin MILLER
Paul Andre LEFEVRE
Aaron PETERSON
Chen-Chih TSAI
United States
United States
United States
United States
PARVINI, PEGAH
2021-12-2117557412SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR HIGH TOPOLOGICAL SELECTIVITYCMC Materials, Inc.Patented Case2024-10-1512116502US20220195244A1
Juyeon CHANG
Sudeep PALLIKKARA KUTTIATOOR
Sajo NAIK
Elliot KNAPTON
Jinfeng WANG
Michael WILLHOFF
United States
United States
United States
United States
United States
United States
MOORE, ALEXANDRA MARIE
2021-10-1817503422UV-CURABLE RESINS USED FOR CHEMICAL MECHANICAL POLISHING PADSCMC Materials, Inc.Patented Case2023-11-0711807710US20220119586A1
Chen-Chih TSAI
Eric S. Moyer
Ping Huang
United States
United States
United States
MCCLENDON, SANZA L
2021-09-1417474543SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMSCMC Materials, Inc.Patented Case2023-10-3111802220US20220089908A1
Brian REISS
Fernando HUNG LOW
Michael MORROW
Helin HUANG
United States
United States
United States
United States
CULBERT, ROBERTS P
2021-08-0217391674TITANIUM DIOXIDE CONTAINING RUTHENIUM CHEMICAL MECHANICAL POLISHING SLURRYCMC Materials, Inc.Patented Case2023-04-1811629271US20220033683A1
Jin-Hao Jhang
Cheng-Yuan Ko
Taiwan
Taiwan
CULBERT, ROBERTS P
2021-07-2617384940CMP COMPOSITION INCLUDING ANIONIC AND CATIONIC INHIBITORSCMC Materials, Inc.Patented Case2025-02-2512234382US20220033682A1
Hsin-Yen WU
Jin-Hao JHANG
Cheng-Yuan KO
Taiwan
Taiwan
Taiwan
OLSEN, ALLAN W
2021-03-3017217097CMP COMPOSITION INCLUDING A NOVEL ABRASIVECMC Materials, IncPatented Case2023-08-1511725116US20210301178A1
Alexander W. HAINS
Kim LONG
Steven GRUMBINE
Roman A. IVANOV
Kevin P. DOCKERY
Benjamin PETRO
Brian SNEED
Galyna KRYLOVA
United States
United States
United States
United States
United States
United States
United States
United States
CULBERT, ROBERTS P
2020-06-0816895714SOLID POLYMER ELECTROLYTE COMPOSITIONS AND METHODS OF PREPARING SAMECabot Microelectronics CorporationPatented Case2023-04-2511637317US20210384552A1
Deepak SHUKLA
Gladys Rocio MONTENEGRO GALINDO
Kevin M. DONOVAN
Zichao YANG
United States
United States
United States
United States
WHITELEY, JESSICA