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SUNEDISON, INC. Patents: Applications Pending, 2008

SUNEDISON, INC. Patent Applications Pending

9 applications still open at the USPTO, newest filing first, as the USPTO Open Data Portal records them; the company is the first-named applicant. The application number opens the full record at Patent Center.

  • 2008-12-29: Application PCTUS2008088452; Invention NANOTOPOGRAPHY CONTROL AND OPTIMIZATION USING FEEDBACK FROM WARP DATA; Applicant MEMC ELECTRONIC MATERIALS, INC.; Status RO PROCESSING COMPLETED-PLACED IN STORAGE.
  • 2008-12-22: Application PCTUS2008087930; Invention EPITAXIAL BARREL SUSCEPTOR HAVING IMPROVED THICKNESS UNIFORMITY; Applicant MEMC ELECTRONIC MATERIALS, INC.; Status RO PROCESSING COMPLETED-PLACED IN STORAGE.
  • 2008-12-22: Application PCTUS2008087927; Invention SUSCEPTOR WITH SUPPORT BOSSES; Applicant MEMC ELECTRONIC MATERIALS, INC.; Status RO PROCESSING COMPLETED-PLACED IN STORAGE.
  • 2008-11-07: Application PCTUS2008082838; Invention REDUCTION OF AIR POCKETS IN SILICON CRYSTALS BY AVOIDING THE INTRODUCTION OF NEARLY INSOLUBLE GASES INTO THE MELT; Applicant MEMC ELECTRONIC MATERIALS, INC.; Status RO PROCESSING COMPLETED-PLACED IN STORAGE.
FiledApplicationInventionApplicantStatusPublished asInventor nameInventor countryExaminer
2008-12-29PCTUS2008088452NANOTOPOGRAPHY CONTROL AND OPTIMIZATION USING FEEDBACK FROM WARP DATAMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
SUMEET S. BHAGAVAT
ROLAND R. VANDAMME
TAKUTO KAZAMA
TOMOHIKO KANEKO
TOMOMI KOMURA
United States
United States
United States
United States
United States
2008-12-22PCTUS2008087930EPITAXIAL BARREL SUSCEPTOR HAVING IMPROVED THICKNESS UNIFORMITYMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
LANCE G. HELLWIG
JOHN A. PITNEY
SRIKANTH KOMMU
United States
United States
United States
2008-12-22PCTUS2008087927SUSCEPTOR WITH SUPPORT BOSSESMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
JOHN A. PITNEY
LANCE G. HELLWIG
MANABU HAMANO
United States
United States
United States
2008-11-07PCTUS2008082838REDUCTION OF AIR POCKETS IN SILICON CRYSTALS BY AVOIDING THE INTRODUCTION OF NEARLY INSOLUBLE GASES INTO THE MELTMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
RICHARD PHILLIPS
HAROLD W. KORB
United States
United States
2008-09-11PCTUS2008076027PROCESSES FOR PURIFICATION OF SILICON TETRAFLUORIDEMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
JAMEEL IBRAHIM
VITHAL REVANKAR
United States
United States
2008-09-02PCTUS2008075048METHOD FOR TREATMENT OF A GAS STREAM CONTAINING SILICON TETRAFLUORIDE AND HYDROGEN CHLORIDEMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
JAMEEL IBRAHIM
VITHAL REVANKAR
United States
United States
2008-06-26PCTUS2008068287DIFFUSION CONTROL IN HEAVILY DOPED SUBSTRATESMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
ROBERT J. FALSTER
VLADIMIR V. VORONKOV
MARCO RAVANI
DONG MYUN LEE
CHANRAE CHO
LUCA MOIRAGHI
United States
United States
United States
United States
United States
United States
2008-06-26PCTUS2008068284SUPPRESSION OF OXYGEN PRECIPITATION IN HEAVILY DOPED SINGLE CRYSTAL SILICON SUBSTRATESMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
ROBERT J. FALSTER
LUCA MOIRAGHI
MARCO RAVANI
CHANRAE CHO
DONG MYUN LEE
United States
United States
United States
United States
United States
2008-06-18PCTUS2008067344SUSCEPTOR FOR IMPROVING THROUGHPUT AND REDUCING WAFER DAMAGEMEMC ELECTRONIC MATERIALS, INC.RO PROCESSING COMPLETED-PLACED IN STORAGE
MANABU HAMANO
SRIKANTH KOMMU
LANCE G. HELLWIG
THOMAS A. TORACK
JOHN A. PITNEY
Japan
United States
United States
United States
United States