ASM INTERNATIONAL N V Patent Applications Rejected
6 applications abandoned without a patent; the status gives the reason, newest filing first, as the USPTO Open Data Portal records them; the company is the first-named applicant. The application number opens the full record at Patent Center.
- 2022-03-08: Application 17653940; Invention METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS; Applicant ASM INTERNATIONAL N.V.; Status Abandoned -- Failure to Respond to an Office Action.
- 2020-06-22: Application 16908241; Invention METHODS FOR DEPOSITING THIN FILMS COMPRISING INDIUM NITRIDE BY ATOMIC LAYER DEPOSITION; Applicant ASM International N.V.; Status Abandoned -- Failure to Respond to an Office Action.
- 2018-07-20: Application 16040863; Invention METAL SILICIDE, METAL GERMANIDE, METHODS FOR MAKING THE SAME; Applicant ASM INTERNATIONAL N.V.; Status Abandoned -- Failure to Respond to an Office Action.
- 2016-11-29: Application 15363348; Invention FLOATING WAFER TRACK WITH LATERAL STABILIZATION MECHANISM; Applicant ASM INTERNATIONAL N.V.; Status Abandoned -- Failure to Respond to an Office Action.
| Filed | Application | Invention | Applicant | Status | Published as | Inventor name | Inventor country | Examiner |
|---|---|---|---|---|---|---|---|---|
| 2022-03-08 | 17653940 | METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS | ASM INTERNATIONAL N.V. | Abandoned -- Failure to Respond to an Office Action | US20230031720A1 | Noboru Takamure Atsuki Fukazawa Hideaki Fukuda Antti Niskanen Suvi Haukka Ryu Nakano Kunitoshi Namba | Japan Japan Japan Finland Finland Japan Japan | HO, ANTHONY |
| 2020-06-22 | 16908241 | METHODS FOR DEPOSITING THIN FILMS COMPRISING INDIUM NITRIDE BY ATOMIC LAYER DEPOSITION | ASM International N.V. | Abandoned -- Failure to Respond to an Office Action | US20200335342A1 | Suvi Haukka Viljami J. Pore Antti Niskanen | Finland Finland Finland | KIM, JAY C |
| 2018-07-20 | 16040863 | METAL SILICIDE, METAL GERMANIDE, METHODS FOR MAKING THE SAME | ASM INTERNATIONAL N.V. | Abandoned -- Failure to Respond to an Office Action | US20190081149A1 | Viljami J. Pore Suvi P. Haukka Tom E. Blomberg Eva E. Tois | Finland Finland Finland Finland | AHMADI, MOHSEN |
| 2016-11-29 | 15363348 | FLOATING WAFER TRACK WITH LATERAL STABILIZATION MECHANISM | ASM INTERNATIONAL N.V. | Abandoned -- Failure to Respond to an Office Action | US20170076935A1 | Ernst Hendrik August Granneman | Netherlands | MILLER, MICHAEL G |
| 2015-12-15 | 14969579 | APPARATUS AND METHOD FOR HIGH-THROUGHPUT ATOMIC LAYER DEPOSITION | ASM INTERNATIONAL N.V. | Abandoned -- Failure to Respond to an Office Action | US20160102399A1 | Ernst H.A. Granneman Sebastiaan E. van Nooten | Netherlands Netherlands | KENDALL, BENJAMIN R |
| 2013-02-19 | 13770815 | ATOMIC LAYER DEPOSITION REACTOR | ASM International N.V. | Abandoned -- Failure to Respond to an Office Action | US20130263783A1 | Leif R. Keto | Finland | LEE, AIDEN Y |